发明名称 |
Laser diode |
摘要 |
A laser diode with an improved kink level in the L-I characteristic and capable of obtaining a stable high output in a horizontal transverse mode is provided. The laser diode includes an active layer made of nitride III-V compound semiconductor containing at least gallium (Ga) in 3B-group elements and at least nitrogen (N) in 5B-group elements, an n-type compound semiconductor layer provided on one of faces of the active layer, and a p-type compound semiconductor layer provided on the other face of the active layer. A region closest to the active layer, in the n-type compound semiconductor layer is a high-concentration region whose impurity concentration is higher than that of the other n-type regions. |
申请公布号 |
US9112333(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201113067595 |
申请日期 |
2011.06.13 |
申请人 |
Sony Corporation |
发明人 |
Obata Toshiyuki;Kawanishi Hidekazu |
分类号 |
H01S5/00;H01S5/343;B82Y20/00;H01S5/30;H01S5/20;H01S5/22 |
主分类号 |
H01S5/00 |
代理机构 |
Fishman Stewart Yamaguchi PLLC |
代理人 |
Fishman Stewart Yamaguchi PLLC |
主权项 |
1. A laser diode comprising:
an n-side electrode touching an n-GaN substrate, the n-GaN substrate being between an n-GaN cladding layer and the n-side electrode; an n-AlGaN guide layer touching the n-GaN cladding layer, the n-GaN cladding layer between the n-GaN substrate and the n-AlGaN guide layer, wherein: a concentration of an n-type impurity in the n-AlGaN guide layer is at least 3×1018 cm−3 along with a concentration of an n-type impurity in the n-GaN substrate being less than 3×1018 cm−3 and a concentration of an n-type impurity in the n-GaN cladding layer being less than 3×1018 cm−3. |
地址 |
Tokyo JP |