Reflector array antenna with crossed polarization compensation and method for producing such an antenna

摘要

A reflector array antenna with cross-polarization compensation including at least one radiating element having an etched pattern dissymmetric with respect to at least one direction X and/or Y of the plane XY of the radiating element, the dissymmetry of the pattern of the radiating element being calculated individually on the basis of a radiating element of the same symmetric pattern along the two directions X and Y, so as to engender a reflected wave having a controlled depolarization which opposes a depolarization, engendered in a plane normal to a direction of propagation, by the reflector array illuminated by a primary source.

主权项

1. A reflector array antenna with cross-polarization compensation comprising
a reflector array consisting of a plurality of elementary radiating elements regularly distributed and forming a reflecting surface; and a primary source intended to illuminate the reflector array; wherein the reflector array having a radiation diagram according to two orthogonal principal polarizations in a chosen direction of propagation with a chosen phase law; each elementary radiating element has been produced in planar technology and comprises an etched pattern consisting of at least one metallic patch and/or of at least one radiating slot,
the metallic patch comprising, in a symmetric configuration, at least four sides that are pairwise opposite with respect to a center of the etched pattern and are disposed parallel to two directions X, Y of the plane XY of the radiating element, andthe radiating slot comprising, in a symmetric configuration of the radiating element, at least two branches that are diametrically opposite with respect to the center of the etched pattern and are disposed parallel to at least one of the directions X and/or Y of the radiating element; and at least one radiating element of the reflector array comprises an etched pattern having a dissymmetric geometric shape with respect to at least one of the directions X and/or Y of the plane XY of the radiating element, the dissymmetry of the etched pattern of the radiating element consisting of an angular inclination of at least one side, respectively of at least one branch, of the geometric shape of the etched pattern with respect to the directions X and/or Y of the plane of the radiating element.