| 摘要 |
<p>A wafer cleaning method comprises the steps of: accommodating a first group of wafers in a first loading bath and accommodating a second group of wafers in a second loading bath; transferring the second group of wafers into a rotation bath to change an arrangement direction of the second group of wafers; changing the arrangement direction of the second group of wafers in the rotation bath; transferring the second group of wafers in the rotation bath and the first group of wafers in the first loading bath into one cleaning bath; and transferring the first and second groups of wafers from the cleaning bath, accommodating the wafers in a separation bath, discriminating the first group of wafers and the second group of wafers, and transferring the wafers from the separation bath to the outside.</p> |
