发明名称 Semiconductor element and manufacturing method thereof
摘要 A manufacturing method of a semiconductor element which can improve productivity and reliability, comprises a step of forming a device structure layer including a semiconductor layer on a first substrate; a step of forming a first metal layer on the device structure layer; a step of forming a second metal layer made of the same material as the first metal layer on a second substrate; a first treatment step of heating and compressing together the first metal layer and the second metal layer placed opposite to each other, thereby bonding them with maintaining a junction interface between the first and second metal layers; and a second treatment step of heating the first and second metal layers to make the junction interface disappear. Either one of the first and second metal layers has a coarse surface having multiple pyramid-shaped protrusions formed at its surface.
申请公布号 US9112113(B2) 申请公布日期 2015.08.18
申请号 US201313772027 申请日期 2013.02.20
申请人 STANLEY ELECTRIC CO., LTD. 发明人 Kazama Takuya
分类号 H01L33/38;H01L33/40;H01L33/02;H01L21/02;H01L33/46;H01L33/22;H01L33/00 主分类号 H01L33/38
代理机构 Holtz, Holtz, Goodman & Chick PC 代理人 Holtz, Holtz, Goodman & Chick PC
主权项 1. A manufacturing method of a semiconductor light emitting element, the method comprising: a step of forming a device structure layer including a semiconductor layer on a first substrate; a step of forming a first metal layer on said device structure layer; a step of forming a second metal layer made of the same material as said first metal layer on a second substrate; a first treatment step of heating and compressing together said first metal layer and said second metal layer placed so as to oppose each other, thereby bonding said first metal layer and said second metal layer while maintaining a junction interface between said first metal layer and said second metal layer; wherein one of said first metal layer and said second metal layer has a coarse surface which faces said junction interface and has multiple pyramid-shaped protrusions, and wherein said first treatment step comprises a step of crushing said pyramid-shaped protrusions; and a second treatment step of heating said first metal layer and said second metal layer to make said junction interface disappear.
地址 Tokyo JP
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