发明名称 ELECTROSTATIC CHUCK AND METHOD OF MANUFACTURING THE SAME
摘要 <p>The present invention relates to an electrostatic chuck capable of reducing high temperature treatment during a manufacturing process, and a method to manufacture the same. According to an embodiment of the present invention, the electrostatic chuck is arranged in a substrate processing apparatus on which a substrate is mounted. The electrostatic chuck comprises: an upper dielectric in which an electrode is printed on a lower surface thereof; an insulating coating layer formed on the lower surface of an upper dielectric, insulating the electrode by covering the same; a lower dielectric layer formed by including a dielectric material cured at 400°C or less, of which an upper surface is bonded to the lower surface of the insulating coating layer; and a base body bonded to the lower surface of the lower dielectric layer with a bonding layer as a medium.</p>
申请公布号 KR20150092845(A) 申请公布日期 2015.08.17
申请号 KR20140013391 申请日期 2014.02.06
申请人 KOREA SEMI TEK CO., LTD. 发明人 LEE, DOO NO;LEE, SUNG KYU;KIM, DONG HAE
分类号 H01L21/683;B23Q3/15;H02N13/00 主分类号 H01L21/683
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