电磁控溅镀阴极;MAGNETRON WITH CONTROLLABLE ELECTROMAGNETIC FIELD

摘要

一种电磁控溅镀阴极，包含：一导磁基板；一封闭的第一永久磁铁环，座于该导磁基板的外围上；一第二永久磁铁座于该导磁基板中心，该第二永久磁铁与该第一永久磁铁的N极相对于该靶面为相反方向；一封闭的电磁线圈设于导磁基板上，且相对于第二永久磁铁而言。电磁线圈邻接于第一永久磁铁环，该电磁线圈导入的电流周期变化以变化电浆团的位置以轰击该靶材；电磁线圈的范围在靶外围至三分之二靶宽之间；一冷却铜底板设于第二永久磁铁条、第一永久磁铁环所包围的空间内且在该封闭的电磁线圈上；及一靶材设于该冷却铜底板上。; a first permanent magnet ring, seated on the substrate periphery; a second permanent magnet ring having N pole opposite thereto is located on the center line of the substrate, and the second permanent magnets; an electromagnetic coil adjacent to the first permanent magnet ring, a cooling copper plate above the electromagnetic coil and beneath a target material so as to cool both. The electromagnetic coil having a current introduced cyclically changed so as to move positions of plasma clusters with the current change.