鎓盐、化学增幅型正型光阻组成物及图案形成方法;ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

本发明提供一种鎓盐，于使用在化学增幅型正型光阻组成物时，图案形成时之解像性提高且获得线边缘粗糙度(LER)小的图案。一种鎓盐，系以下列通式(0-1)表示; 【化1】(式中，R f 表示氟原子或三氟甲基;Y表示碳数3~30之环状烃基，该环状烃基中之氢原子也可取代为杂原子单体或亦可经杂原子取代之1价之烃基，该环状烃基之环状结构中及该1价之烃基中也可以插入有杂原子;M ＋ 表示1价阳离子) 。; Y represents a cyclic hydrocarbon group having 3 to 30 carbon atoms, the hydrogen atom in the cyclic hydrocarbon group may be substituted by a hetero atom itself or a monovalent hydrocarbon group which may be substituted by a hetero atom(s), and the hetero atom(s) may be interposed into the cyclic structure of the cyclic hydrocarbon group and the monovalent hydrocarbon group; and M + represents a monovalent cation. There can be provided an onium salt which can improve resolution at the time of forming a pattern and give a pattern with less line edge roughness (LER) when it is used in a chemically amplified positive resist composition.