HIGH-FREQUENCY POWER SUPPLY DEVICE, AND PLASMA IGNITION METHOD

摘要

This high-frequency power supply device is provided with: a plasma ignition step in which pulsed power for igniting plasma is supplied; and a drive-power supplying step in which drive power for maintaining the generated plasma is supplied. In the plasma ignition step, an ignition pulse applied by an ignition pulse output operation is configured from a main pulse which induces ignition, and a pre-pulse which is applied at a stage prior to the main pulse, and which has a lower power than the main pulse. As a result of configuring the ignition pulse from the main pulse and the pre-pulse, the high-frequency power supply is protected from reflected-wave power, and plasma is reliably ignited.