EXPOSURE APPARATUS, MASK, AND OPTICAL FILM

摘要

Provided is an exposure apparatus including a transporting section; a first polarized light output section that outputs first polarized light; a second polarized light output section that outputs second polarized light; a first mask section that has formed therein a first aperture section that passes the first polarized light for exposing an orientation film and blocks the first polarized light; and a second mask section that has formed therein a second aperture section that passes the second polarized light for exposing the orientation film and blocks the second polarized light. The first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner.

主权项

1. An exposure apparatus comprising:
a transporting section that transports a substrate with an orientation film formed thereon in a transport direction; a first polarized light output section that outputs first polarized light having a first polarization direction toward the orientation film of the substrate; a second polarized light output section that is arranged downstream from the first polarized light output section in the transport direction, and outputs second polarized light having a second polarization direction toward the orientation film of the substrate, the second polarization direction intersecting the first polarization direction at an angle of less than 90 degrees; a first mask section that is arranged between the substrate and the first polarized light output section, has formed therein a first aperture section that passes the first polarized light for exposing the orientation film, and blocks the first polarized light; and a second mask section that is arranged between the substrate and the second polarized light output section, has formed therein a second aperture section that passes the second polarized light for exposing the orientation film, and blocks the second polarized light, wherein the first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner, the first aperture section has a first aperture region that passes the first polarized light toward the certain region, and the second aperture section has a second aperture region that passes the second polarized light toward the certain region.