发明名称 A DRAM MEMORY DEVICE WITH MANUFACTURABLE CAPACITOR
摘要 A high capacitance embedded capacitor and associated fabrication processes are disclosed for fabricating a capacitor stack in a multi-layer stack to include a first capacitor plate conductor formed with a cylinder-shaped storage node electrode formed in the multi-layer stack, a capacitor dielectric layer surrounding the cylinder-shaped storage node electrode, and a second capacitor plate conductor formed from a conductive layer in the multi-layer stack that is sandwiched between a bottom and top dielectric layer, where the cylinder-shaped storage node electrode is surrounded by and extends through the conductive layer.
申请公布号 WO2015117222(A1) 申请公布日期 2015.08.13
申请号 WO2015CA00055 申请日期 2015.02.02
申请人 CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. 发明人 RHIE, HYOUNG SEUB
分类号 H01L27/108;G11C11/34;H01L29/40 主分类号 H01L27/108
代理机构 代理人
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