ADHERED SUBSTANCES REMOVING DEVICE, AND VAPOR DEPOSITION SYSTEM AND REMOVAL METHOD USING SUCH ADHERED SUBSTANCES REMOVING DEVICE

摘要

Provided is an adhered substances removing device that removes adhered substances adhered to a workpiece. The adhered substances removing device includes: a particulate injecting unit that faces the workpiece, injects a particulate, which sublimates in an atmosphere toward the workpiece, and releases adhered substances from the workpiece; and a dry gas supplying unit that supplies dry gas to the atmosphere in which the particulate is injected onto the workpiece by the particulate injecting unit.

主权项

1. An adhered substances removing device for removing adhered substances adhered to a workpiece, the adhered substances removing device comprising:
a particulate injection unit configured to inject a particulate, which sublimates in an atmosphere, from a injection nozzle toward the workpiece, and to release the adhered substances from the workpiece; and a dry gas supplying unit configured to supply dry gas to the atmosphere in which the particulate is injected onto the workpiece by the particulate injection unit.