发明名称 ELECTRON TUBE
摘要 In an electron tube, an atomic layer deposition method is used to form an electrical resistance film having a stacked structure of electrically insulating layers and electrically conductive layers or a mixed structure of an electrically insulating material and an electrically conductive material, so as to cover the whole of an inner wall surface and an outer wall surface of a second envelope. By use of the atomic layer deposition method, the firm and fine electrical resistance film with a desired resistance can be formed on an insulation surface, without containing a material such as a binder. When the electrical resistance film is provided with slight electrical conductivity, it can suppress occurrence of withstand voltage failure due to electrification of the insulation surface or the like and realize stability of withstand voltage characteristics.
申请公布号 US2015228439(A1) 申请公布日期 2015.08.13
申请号 US201314425917 申请日期 2013.07.31
申请人 HAMAMATSU PHOTONICS K.K. 发明人 Hamana Yasumasa;Nagata Takaaki;Nakamura Kimitsugu
分类号 H01J29/86;H01J40/18 主分类号 H01J29/86
代理机构 代理人
主权项 1. An electron tube comprising: a cylindrical housing in which an insulation surface with an electrical insulation property is located on the inside; and an electrical resistance film covering the insulation surface, wherein the electrical resistance film has a stacked structure of an electrically insulating layer and an electrically conductive layer formed by an atomic layer deposition method.
地址 Hamamatsu-shi, Shizuoka JP