发明名称 |
DEFECT DETECTION AND CLASSIFICATION BASED ON ATTRIBUTES DETERMINED FROM A STANDARD REFERENCE IMAGE |
摘要 |
Systems and methods for classifying defects detected on a wafer are provided. One method includes detecting defects on a wafer based on output generated for the wafer by an inspection system. The method also includes determining one or more attributes for at least one of the defects based on portions of a standard reference image corresponding to the at least one of the defects. The method further includes classifying the at least one of the defects based at least in part on the one or more determined attributes. |
申请公布号 |
WO2015120193(A1) |
申请公布日期 |
2015.08.13 |
申请号 |
WO2015US14682 |
申请日期 |
2015.02.05 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
GAO, LISHENG;RAY-CHAUDHURI, AVIJIT;BABULNATH, RAGHAV |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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