发明名称 MATERIAL EVALUATION DEVICE AND METHOD
摘要 Provided is a material evaluation device, wherein a detector (12) uses an electron beam emitted from an electron beam irradiation unit (11) to detect reflected electrons or secondary electrons that are discharged from a sample (10), one end of the detector (12) is set apart from the sample (10) so as to face said sample in a non-contact state, and the other end is supported and fixed by a drive mechanism (13). The drive mechanism (13) is capable of moving the detector (12) in a three-dimensional manner to a discretionary position relative to the sample (10). As a result of this configuration, it is possible to suitably detect reflected electrons and secondary electrons that are scattered in arbitrary directions, thereby achieving an accurate crystal grain size evaluation in which no crystal grain boundaries are missed and obtaining an isotropic surface shape image.
申请公布号 WO2015118605(A1) 申请公布日期 2015.08.13
申请号 WO2014JP52536 申请日期 2014.02.04
申请人 FUJITSU LIMITED 发明人 YAMAGUCHI, HIDESHI;SOEDA, TAKESHI
分类号 G01N23/225;H01J37/244 主分类号 G01N23/225
代理机构 代理人
主权项
地址