LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is advantageous in terms of accuracy of positioning of a beam on a substrate.SOLUTION: A lithographic apparatus for forming patterns on a substrate 3, comprises: a lens barrel part 10 for accommodating an optical system that irradiates the substrate 3 with the beam to form the patterns; a reflection member 6 provided on the lens barrel part 10 and containing a reflection plane in parallel to an optic axis of the optical system; and a measurement part for measuring a rotation angle of the lens barrel part by respectively making a measurement light incident on at least of three incident parts not on a linear line on the reflection plane. In the reflection member 6, a through hole is formed in an area between at least three incident parts in a direction parallel to the optic axis, and the reflection member 6 is held to the lens barrel part 10 through a holding member in the through hole.