| 发明名称 |
CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM WRITING METHOD |
| 摘要 |
A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas. |
| 申请公布号 |
US2015228455(A1) |
申请公布日期 |
2015.08.13 |
| 申请号 |
US201514607559 |
申请日期 |
2015.01.28 |
| 申请人 |
NuFlare Technology, Inc. |
发明人 |
MOTOSUGI Tomoo;OHNISHI Takayuki;TSURUTA Kaoru;OHTOSHI Kenji |
| 分类号 |
H01J37/317;H01J37/10;H01J37/20;H01J37/302;H01J37/21 |
主分类号 |
H01J37/317 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A charged particle beam writing apparatus comprising:
an emission unit configured to emit a charged particle beam; a stage configured to mount thereon a target object to be written; an objective lens configured to focus the charged particle beam on a surface of the target object; a chamber configured to house the stage; a measurement unit configured to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure; and an adjustment unit configured to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas. |
| 地址 |
Yokohama JP |
