Generating Guiding Patterns For Directed Self-Assembly

摘要

Aspects of the disclosed technology relate to techniques of generating guiding patterns for via-type feature groups. A guiding pattern is constructed based on seeding positions for a via-type feature group. The initial seeding positions are derived from targeted locations of via-type features in the via-type feature group. A potential energy function is then determined for the guiding pattern. Based on the potential energy function, simulated locations of the via-type features are computed. The seeding positions are compared with the targeted locations and may be adjusted based on differences between the simulated locations and the targeted locations. The above operations may be repeated until one of one or more termination conditions are met.

主权项

1. One or more processor-readable storage devices storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
A: constructing a guiding pattern for a via-type feature group based on seeding positions, wherein the via-type feature group comprises two or more via-type features in a layout design and the seeding positions are initially derived from targeted locations of the two or more via-type features; B: determining a potential energy function for the guiding pattern, wherein the potential energy function is at least a two-dimensional function and comprises a first portion representing interactions between via-type features in the via-type feature group and a second portion representing wall effects of the guiding pattern; C: computing simulated locations of the two or more via-type features based on the potential energy function; D: changing the seeding positions based on differences between the simulated locations and the targeted locations; and F: repeating operations A through D until one of one or more termination conditions is met.