| 发明名称 |
PATCH PRODUCTION |
| 摘要 |
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen. |
| 申请公布号 |
US2015224294(A1) |
申请公布日期 |
2015.08.13 |
| 申请号 |
US201414508451 |
申请日期 |
2014.10.07 |
| 申请人 |
The University of Queensland |
发明人 |
KENDALL Mark Anthony Fernance;JENKINS Derek William Kenneth |
| 分类号 |
A61M37/00 |
主分类号 |
A61M37/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of producing projections on a patch, the method including:
a) providing a mask on a substrate; and, b) etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the etching process is continuously controlled using the etchant and the passivant, and wherein the passivant does not include oxygen. |
| 地址 |
Queensland AU |
