发明名称 RETORT AND CORRESPONDING OVEN WITH DUCTWORK
摘要 Summary: Method and system for processing a substance in a retort (1) wherein the retort comprises at least one flow deflector internal to the retort. A substance (8) is loaded into the retort (1), the retort (1) is positioned or located in an oven (9), a first (10) and second (11) duct are attacked to the retort, a heat carrier fluidum is passed through the substance (8) in the retort (1) for drying and/or heating the substance inside the retort, an indirect heat is transfer is applied over the wall (3) of the retort (1) and process progress is controlled by means of a controlled indirect heat transfer and/or a flow provided into the retort inlet comprising a heat carrier fluidum.
申请公布号 US2015225651(A1) 申请公布日期 2015.08.13
申请号 US201314425000 申请日期 2013.08.27
申请人 CLEAN FUELS B.V. 发明人 Siemons Roland;Baaijens Louwerens
分类号 C10B51/00;C10B1/04 主分类号 C10B51/00
代理机构 代理人
主权项 1. A retorting system configured for a batch-wise processing of a substance (8), comprising a retort (1), an oven (9), ductwork and a control system (15), wherein: a) the retorting system is configured for accommodating the retort (1) in the oven (9); b) the ductwork comprises a first (10) and a second duct (11); c) the retort (1) comprises at least one retort outlet (6) for extracting a product fluidum during the processing, and an opening for loading the retort with the substance prior to the processing and for discharging the processed substance after the processing; the retort outlet (6) being provided at a downwards facing part of the retort (1) d) the retort is coupled to the first (10) and the second duct (11) of the ductwork e) the retort comprises at least one flow deflector (4), internal to the retort, for controlling a direction of a heat carrier fluidum from the first duct (10) via the at least one flow deflector (4) through the retort (1) to the second duct (11); whereby the heat carrier fluidum flows from a top of the retort downwards towards the retort outlet, f) the control system is arranged to control a flow of heat carrier fluidum through the first duct (10), the retort (1) via the at least one flow deflector (4) and the second duct (11) for direct heat transfer to the substance (8) inside the retort (1), andan indirect heat transfer to heat the substance (8) in the retort (1) from outside the retort across the retort wall (3), wherein the indirect heat transfer is applied non-uniformly over the surface of the wall (3) of the retort (1) to initiate, in operation, a reaction at a position remote from the retort outlet and to progress the reaction downwards towards the retort outlet.
地址 Enschede NL