发明名称 MEMS ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a MEMS element which suppresses the generation of gas from an inner wall in a space in which a MEMS part is positioned. ! SOLUTION: A MEMS element includes a MEMS part 15 positioned in a space 61 covered by silicon nitride films 14, 36 and a silicon film 18. The MEMS part is arranged on the silicon nitride film. The silicon film is arranged above the MEMS part and adhered on the silicon nitride film positioned around the MEMS part. The silicon film has first and second ring-shaped holes 18a, 18b. The silicon film positioned inside the first and second ring-shaped holes is electrically connected to the MEMS part. The first and second ring-shaped holes are each filled with the silicon nitride film. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015145036(A) 申请公布日期 2015.08.13
申请号 JP20140018255 申请日期 2014.02.03
申请人 SEIKO EPSON CORP 发明人 EBINA AKIHIKO
分类号 B81B3/00;B81C1/00;H03H3/007;H03H9/24 主分类号 B81B3/00
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