发明名称 PHOTOMASK BLANK AND PHOTOMASK FOR SUPPRESSING HEAT ABSORPTION
摘要 A photomask blank and/or photomask includes a light transmitting substrate, a highly reflective material layer disposed on the light transmitting substrate, and a transfer pattern layer disposed on the highly reflective material layer. The highly reflective material layer reflects light to be transmitted through the light transmitting substrate, with a predetermined reflectivity.
申请公布号 US2015227040(A1) 申请公布日期 2015.08.13
申请号 US201414550847 申请日期 2014.11.21
申请人 SK hynix Inc. 发明人 HA Tae Joong
分类号 G03F1/38;G03F1/52 主分类号 G03F1/38
代理机构 代理人
主权项 1. A photomask blank, comprising: a light transmitting substrate; a highly reflective material layer disposed over the light transmitting substrate; and a light shielding layer disposed over the highly reflective material layer.
地址 Icheon KR