发明名称 LOAD PORT AND EFEM
摘要 PROBLEM TO BE SOLVED: To provide a load port capable of increasing sealability within an EFEM to reduce a supply amount of a gas to be used in the EFEM, and improving quality of a wafer. ! SOLUTION: A load port provided adjacent to a wafer transfer chamber, for taking in and out a wafer W between the wafer transfer chamber and an FOUP, includes: a panel 31 constituting a part of a wall surface of the wafer transfer chamber and formed with an opening 42 for opening the inside of the wafer transfer chamber; a door part 61 for opening and closing the opening; a mounting stand 34 for mounting the FOUP so as to allow a lid part capable of opening and closing an internal space to face the door part 61 to allow the FOUP to advance and retreat with respect to the panel 31; and an O ring 44 provided in a side of the mounting stand 34 of the panel 31 and along the circumference of the opening. When the mounting stand 34 is moved toward the panel 31, the O ring is elastically brought into contact with the circumfere
申请公布号 JP2015146347(A) 申请公布日期 2015.08.13
申请号 JP20140017819 申请日期 2014.01.31
申请人 SINFONIA TECHNOLOGY CO LTD 发明人 OCHIAI MITSUTOSHI;NAKANO TAKAAKI
分类号 H01L21/677 主分类号 H01L21/677
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