发明名称 |
LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES |
摘要 |
A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent. |
申请公布号 |
WO2015084735(A3) |
申请公布日期 |
2015.08.13 |
申请号 |
WO2014US67955 |
申请日期 |
2014.12.01 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
LEE, TZU-CHEN;DEVOE, ROBERT J.;NELSON, BRIAN K.;GATES, BRIAN J. |
分类号 |
C08F2/46 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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