| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide: an exposure device and an exposure method, with which a mask pattern can be accurately exposed and transferred in relation to a shape of an exposed region of a workpiece even if the workpiece is distorted, and exposure accuracy can also be increased by improving the illumination distribution of exposure light; and a reflecting mirror with a mirror bending mechanism.SOLUTION: An exposure device PE includes a light source 60, an integrator 65, and a plurality of reflecting mirrors 63, 66, 67, 68 reflecting exposure light from the light source 60. In an illumination optical system 3 irradiating the exposure light from the light source 60 on a workpiece W via a mask M, two reflecting mirrors 66, 68 among the reflecting mirrors 63, 66, 67, 68 include a mirror deformation unit (mirror bending mechanism) 70 capable of correcting the curvature of the reflecting mirrors 66, 68, and disposed in an optical path EL between the integrator 65 and the mask M.</p> |
