GAS SUPPLYING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

A gas supplying method of supplying a process gas containing a gas of at least one gaseous species into a process space in a semiconductor manufacturing apparatus includes supplying the process gas by controlling a flow rate value of the gas to be a first value during a first period; supplying the process gas by controlling the flow rate value of the gas to be a second value smaller than the first value during a second period; supplying the process gas by controlling the flow rate value of the gas to be a third value greater than the first value during a third period; and supplying the process gas by controlling the flow rate value of the gas to be a fourth value smaller than the second value during a fourth period, wherein these steps are periodically repeated in a predetermined order.

主权项

1. A gas supplying method of supplying a process gas containing a gas of at least one gaseous species into a process space in a semiconductor manufacturing apparatus, the gas supplying method comprising:
a first step of supplying the process gas containing the gas by controlling a flow rate value of the gas to be a first flow rate value during a first period; a second step of supplying the process gas containing the gas by controlling the flow rate value of the gas to be a second flow rate value smaller than the first flow rate value during a second period; a third step of supplying the process gas containing the gas by controlling the flow rate value of the gas to be a third flow rate value greater than the first flow rate value during a third period; and a fourth step of supplying the process gas containing the gas by controlling the flow rate value of the gas to be a fourth flow rate value smaller than the second flow rate value during a fourth period, wherein the first step, the second step, the third step, and the fourth step are periodically repeated in a predetermined order.