| 发明名称 |
MODIFIED POLYSILAZANE, COATING SOLUTION CONTAINING SAID MODIFIED POLYSILAZANE, AND GAS BARRIER FILM PRODUCED USING SAID COATING SOLUTION |
| 摘要 |
The present invention provides a method for producing a gas barrier film having exceptional storage stability, especially storage stability under rigorous conditions (high-temperature, high-humidity conditions). This modified polysilazane has a ratio ((SiH3:(SiH+SiH2)) of SiH3 and the total of SiH and SiH2 of 1:10-30 as measured by 29Si-NMR. |
| 申请公布号 |
WO2015119260(A1) |
申请公布日期 |
2015.08.13 |
| 申请号 |
WO2015JP53435 |
申请日期 |
2015.02.06 |
| 申请人 |
KONICA MINOLTA, INC. |
发明人 |
ITOH, HIROAKI |
| 分类号 |
C01B21/082;B32B9/00;C08G77/62;C09D183/16;H01L51/50;H05B33/02;H05B33/04 |
主分类号 |
C01B21/082 |
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