| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method which can achieve appropriate illumination conditions required for faithfully transferring mask patterns with various characteristics, for example illumination conditions rich in diversity for light intensity distribution and a polarization state of a secondary light source.SOLUTION: An illumination optical device for illuminating an irradiated surface M includes: illumination pupil formation means 3, 4, 7, and 8 for forming illumination pupil distribution with light intensity distribution positioned in a central region including an optical axis AX and light intensity distribution positioned in a plurality of peripheral regions with an interval from the optical axis AX on a pupil surface of the illumination optical device or in the vicinity thereof; and region changing means 6 (6a and 6b) for changing the position and the size of the light intensity distribution positioned in the plurality of peripheral regions independently of the light intensity distribution positioned in the central region.</p> |
