发明名称 |
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION METHOD USING SAME |
摘要 |
The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages. |
申请公布号 |
EP2905657(A1) |
申请公布日期 |
2015.08.12 |
申请号 |
EP20130844490 |
申请日期 |
2013.10.01 |
申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L. |
发明人 |
YAMAMOTO, KAZUMA;ISHII, MASAHIRO;SEKITO, TAKASHI;YANAGITA, HIROSHI;NAKASUGI, SHIGEMASA;NOYA, GO |
分类号 |
G03F7/40;C08F12/24;C08F20/30;H01L21/027 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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