发明名称 プラズマ生成装置、プラズマ処理装置及びプラズマ処理方法
摘要 <p>An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.</p>
申请公布号 JP5762708(B2) 申请公布日期 2015.08.12
申请号 JP20100207774 申请日期 2010.09.16
申请人 发明人
分类号 H05H1/24;H05H1/46 主分类号 H05H1/24
代理机构 代理人
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