发明名称 透明酸化物膜及びその製造方法並びに酸化物スパッタリングターゲット
摘要 PROBLEM TO BE SOLVED: To provide a zinc oxide-based transparent oxide film with a low refractive index and an excellent gas barrier property, a method for manufacturing the same, and an oxide sputtering target.SOLUTION: A transparent oxide film is an oxide having a composition of, with respect to the total metal content, 3-13 at% Al, 21-59 at% Si, and 10-48 at% Mg, with the balance being Zn and inevitable impurities. The sputtering target used to manufacture the transparent oxide film consists of an oxide sintered compact having a composition of, with respect to the total metal content, 3-8 at% Al, 11-27 at% Si, and 5-18 at% Mg, with the balance being Zn and inevitable impurities.
申请公布号 JP5761528(B2) 申请公布日期 2015.08.12
申请号 JP20120049505 申请日期 2012.03.06
申请人 发明人
分类号 C23C14/08;C04B35/453 主分类号 C23C14/08
代理机构 代理人
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