发明名称 |
Nanowire PIN tunnel field effect devices |
摘要 |
A nanowire tunnel device includes a nanowire suspended above a semiconductor substrate by a first pad region and a second pad region, the nanowire having a channel portion surrounded by a gate structure disposed circumferentially around the nanowire, an n-type doped region including a first portion of the nanowire adjacent to the channel portion, and a p-type doped region including a second portion of the nanowire adjacent to the channel portion. |
申请公布号 |
US9105482(B2) |
申请公布日期 |
2015.08.11 |
申请号 |
US201213556300 |
申请日期 |
2012.07.24 |
申请人 |
International Business Machines Corporation |
发明人 |
Bangsaruntip Sarunya;Koester Stephen J.;Majumdar Amlan;Sleights Jeffrey W. |
分类号 |
H01L21/00;H01L21/04;B82Y10/00;H01L29/06;H01L29/423;H01L29/66;H01L29/739 |
主分类号 |
H01L21/00 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP ;Alexanian Vazken |
主权项 |
1. A nanowire tunnel device, comprising:
a nanowire spaced apart and above a semiconductor substrate by a first pad region and a second pad region, the nanowire having a channel portion surrounded by a gate structure disposed circumferentially around the nanowire, the gate structure comprising a metal layer and a conductive polysilicon capping layer disposed directly onto and encapsulating the metal layer; a first protective spacer adjacent to a sidewall of the gate structure and around portions of the nanowire extending from the gate structure; a second protective spacer adjacent to the first protective spacer, the second protective spacer is formed and fills a space between an exposed region of the nanowire and the semiconductor substrate; an n-type doped region including a first portion of the nanowire adjacent to the channel portion; and a p-type doped region including a second portion of the nanowire adjacent to the channel portion. |
地址 |
Armonk NY US |