Methods for the fabrication of graphene nanoribbon arrays using block copolymer lithography

摘要

Methods of fabricating patterned substrates, including patterned graphene substrates, using etch masks formed from self-assembled block copolymer films are provided. Some embodiments of the methods are based on block copolymer (BCP) lithography in combination with graphoepitaxy. Some embodiments of the methods are based on BCP lithography techniques that utilize hybrid organic/inorganic etch masks derived from BCP templates. Also provided are field effect transistors incorporating graphene nanoribbon arrays as the conducting channel and methods for fabricating such transistors.

主权项

1. A method of fabricating a graphene nanoribbon array, the method comprising:
forming a graphoepitaxy channel over a graphene substrate, the channel comprising side walls and a floor; depositing a layer of a surface-modifying copolymer on the side walls and the floor of the channel; depositing a block copolymer in the channel and subjecting the block copolymer to conditions under which spatial confinement of the block copolymer by the channel induces the block copolymer to self-assemble into a plurality of domains, such that the self-assembled block copolymer layer defines a striped pattern over the graphene substrate, wherein the stripes in the striped pattern are oriented parallel with respect to the graphene substrate surface and perpendicular with respect to the channel side walls; and transferring the striped pattern into the graphene substrate to provide the graphene nanoribbon array.