Exposure apparatus and device fabrication method for reducing a change in aberration due to driving error

摘要

The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which passes through the projection optical system, a detecting unit configured to detect a driving error when the driving unit drives a first optical element of the plurality of optical elements, and a control unit configured to control the driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the imaging state of the light which passes through the projection optical system due to the driving error.

主权项

1. An exposure apparatus comprising:
a projection optical system configured to project a pattern of a reticle onto a substrate; a driving unit configured to drive a plurality of optical elements which form said projection optical system so as to adjust an aberration of said projection optical system; a detecting unit configured to detect a driving error when said driving unit drives a first optical element of the plurality of optical elements; and a control unit configured to control said driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the aberration of said projection optical system due to the driving error, wherein said control unit has information representing a relationship between the driving error and a driving amount of the second optical element, which is necessary to reduce the change in the aberration of said projection optical system due to the driving error, and said control unit controls said driving unit based on the information and the driving error detected by said detecting unit.