| 主权项 |
1. A plasma processing apparatus for plasma-processing an object to be processed by exciting a gas by using electromagnetic waves, the plasma processing apparatus comprising:
a processing container; an electromagnetic wave source which outputs electromagnetic waves; a transmission line through which the electromagnetic waves output from the electromagnetic wave source are transmitted; a plurality of dielectric plates which are arranged on an inner surface of the processing container and through which the electromagnetic waves are emitted into the processing container; at least three first coaxial waveguides which are adjacent to the plurality of dielectric plates and through which the electromagnetic waves are transmitted to the plurality of dielectric plates; wherein a first dielectric member is buried in at least one of the at least three first coaxial waveguides, and a coaxial waveguide distributor which distributes and transmits the electromagnetic waves transmitted through the transmission line to the at least three first coaxial waveguides, wherein the coaxial waveguide distributor comprises: a main coaxial waveguide, at least one third coaxial waveguides connected to a first connection portion of the main coaxial waveguide, and at least one fourth coaxial waveguides connected to a second connection portion of the main coaxial waveguide, and the at least one fourth coaxial waveguides and at least two of the at least three first coaxial waveguides are connected to each other by one-to-many correspondence via a fifth coaxial waveguide, and the at least one third coaxial waveguides and remaining of the at least three first coaxial waveguides are connected to each other by one-to-one correspondence; wherein the at least three first coaxial waveguides are connected at regular pitches respectively to the plurality of dielectric plates, and wherein the first, the third, the fourth and the fifth coaxial waveguides are connected to the electromagnetic wave source. |
