| 发明名称 | Chamber matching using voltage control mode | ||
| 摘要 | Systems and methods for compensating for harmonics produced during plasma processing in a plasma chamber are described. One of the methods includes retrieving a measurement of a combined waveform. The combined waveform includes a fundamental waveform and a harmonic waveform. The combined waveform defines a voltage proximate to a surface of a chuck, which is coupled to a radio frequency (RF) transmission line. The RF transmission line is coupled to an impedance matching circuit. The impedance matching circuit is coupled to an RF generator. The method further includes extracting the fundamental waveform from the combined waveform, determining a difference between a magnitude of the combined waveform and a magnitude of the fundamental waveform, and controlling the RF generator to compensate for the difference. | ||
| 申请公布号 | US9107284(B2) | 申请公布日期 | 2015.08.11 |
| 申请号 | US201313800381 | 申请日期 | 2013.03.13 |
| 申请人 | Lam Research Corporation | 发明人 | Albarede Luc |
| 分类号 | H05H1/46;H01J37/32 | 主分类号 | H05H1/46 |
| 代理机构 | Martine Penilla Group, LLP | 代理人 | Martine Penilla Group, LLP |
| 主权项 | 1. A method for compensating for harmonics produced during plasma processing in a plasma chamber, the method comprising: retrieving a measurement of a combined waveform, the combined waveform including a fundamental waveform and a harmonic waveform, the combined waveform defining a voltage proximate to a surface of a chuck, the chuck coupled to a radio frequency (RF) transmission line, the RF transmission line coupled to an impedance matching circuit, the impedance matching circuit coupled to an RF generator; extracting the fundamental waveform from the combined waveform; determining a difference between a magnitude of the combined waveform and a magnitude of the fundamental waveform; and controlling the RF generator to compensate for the difference, wherein the method is executed by one or more processors. | ||
| 地址 | Fremont CA US | ||