| 主权项 |
1. A distributed power arrangement to provide local power delivery in a plasma processing system during substrate processing, comprising:
a single direct current (DC) power supply; a common rail arrangement coupled to the DC power supply; and a plurality of power generators coupled to a single chamber, said plurality of power generators being configured to receive power from said single DC power supply via the common rail arrangement, wherein each power generator of said plurality of power generators being coupled to a set of electrical elements, each power generator of said plurality of power generators to be at different locations in relation to others of said plurality of power generators during said substrate processing and to control said local power delivery to said each power generator of said plurality of power generators at said different locations, further wherein said each power generator of said plurality of power generators is a modularized unit, said each power generator including a power amplifier module, a match impedance component, a probe, and a local controller, a main controller, said main controller being configured to interact with said plasma processing system, said local controller that is located within said each power generator of said plurality of power generators, said local controller being configured to interact with said main controller, wherein interaction includes receiving instructions from said main controller, said main controller is configured to monitor status for said each power generator by receiving status data from said local controller associated with said each power generator. |
