Manufacturing method of solid-state imaging device and solid-state imaging device

摘要

A manufacturing method of a solid-state imaging device includes: preparing a photoelectric conversion device; forming an insulating layer on a surface of the photoelectric conversion device; forming a wire-grid polarizer on a support base; bonding a forming surface of the wire-grid polarizer on the support base to the insulating layer on the surface of the photoelectric conversion device and removing the support base from the wire-grid polarizer.

主权项

1. A solid-state imaging device comprising:
a passivation layer on a sidewall of a wire-grid polarizer, said passivation layer extending from a first surface of the wire-grid polarizer to a second surface of the wire-grid polarizer; a micro-lens between a base device and a first insulating layer, said first insulating layer being between said first surface of the wire-grid polarizer and said micro-lens.