发明名称 Carrier tape for tab-package and manufacturing method thereof
摘要 The present invention relates to a carrier tape for TAB-package and a manufacturing method thereof, wherein a TAB tape including a base film having a central area and edge areas at both directions of the central area, a wiring pattern formed at the central area of the base film, a transfer area formed at the edge area of the base film and exposed by the base film, a plurality of sprocket holes arranged in a row on the transfer area and a metal pattern discretely formed from the wiring pattern, and formed at the edge areas of the base film, wherein the metal pattern is formed with a paired structure formed at both sides of the plurality of sprocket holes, such that the present invention has an advantageous effect in that no Cu layer or a metal layer exists at a portion of the sprocket holes from which friction is generated by a driving roller during assembly work between a drive IC and chips/drive IC and panel to dispense with generation of foreign objects such as Cu particles, thereby enhancing reliability of the product.
申请公布号 US9105631(B2) 申请公布日期 2015.08.11
申请号 US201414304526 申请日期 2014.06.13
申请人 LG INNOTEK CO., LTD. 发明人 Hong Tae Ki;Jo Dong Guk;Koo Han Mo;Lim Jun Young;Park Ki Tae;Cho Sang Ki;Yoo Dae Sung;Song Nak Ho;Kim Joo Chul;Jo Jae Sung
分类号 H05K1/11;H01L23/00;H01L23/498 主分类号 H05K1/11
代理机构 Saliwanchik, Lloyd & Eisenschenk 代理人 Saliwanchik, Lloyd & Eisenschenk
主权项 1. A TAB tape, comprising: a base film having a central area and edge areas at both directions of the central area; a wiring pattern formed at the central area of the base film; a transfer area formed at the edge area of the base film and including an exposure area exposing the base film; a plurality of sprocket holes arranged in a row on the transfer area; and a metal pattern discretely formed from the wiring pattern, and formed in the transfer area, wherein the metal pattern is formed with a paired structure formed at both sides of the plurality of sprocket holes, and wherein the exposure area is continuous between the sprocket holes such that the base film is exposed continuously between each sprocket hole and its adjacent sprocket holes.
地址 Seoul KR