| 摘要 |
<p>The purpose of the present invention is to provide a load port capable of increasing airtightness inside an EFEM, reducing the supplied amount of gas used for the EFEM and improving the quality of a wafer. The load port is installed near a wafer conveying chamber (2) to conduct the entry and exit of a wafer (W) between the wafer conveying chamber (2) and an FOUP (7). The load port comprises: a panel (31) constituting a part of the wall surface of the wafer conveying chamber (2) and having an opening (42) formed to open the wafer conveying chamber (2); a door part (61) for opening and closing the opening (42); a loading stand (34) for loading an FOUP (7) to be able to move to and from the panel (31) so that a cover part (72) for opening and closing an inner space (Sf) can face the door part (61); an O-ring (44) installed at the side of the loading stand (34) of the panel (31) along the periphery of the opening (42), wherein the O-ring (44) is in elastic contact with the vicinity of the cover part (72) in the FOUP (7) by moving the loading stand (34) toward the panel (31).</p> |
