METHOD OF MANUFACTURING A SURFACE-ENHANCED RAMAN SCATTERING ACTIVE SUBSTRATE

摘要

The present invention relates to a surface enhanced Raman scattering active substrate includes the steps of: arranging an etching mask, including an organic film and a pattern layer, which is arranged on the organic film and includes openings in the shapes of microholes or nanoholes and in the uniform size, on a base substrate; forming a number of pores by etching the base substrate using plasma in a condition that the etching mask is arranged; and forming a metal layer on the etched base substrate.