摘要 |
<p>The present invention provides a substrate processing apparatus. The substrate processing apparatus includes a housing, a support unit which supports a substrate in the housing and rotates the substrate, and a cleaning unit which cleans the substrate supported on the support unit. The cleaning unit includes a roll brush which has a longitudinal direction in parallel to the substrate supported on the support unit and rotates around a central axis, and a power transmitting member which is provided to correspond to the roll brush, is combined to both ends of the roll brush, and transmits power to both ends of the roll brush.</p> |