发明名称 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
摘要 <p>The present invention provides a substrate processing apparatus. The substrate processing apparatus includes a housing, a support unit which supports a substrate in the housing and rotates the substrate, and a cleaning unit which cleans the substrate supported on the support unit. The cleaning unit includes a roll brush which has a longitudinal direction in parallel to the substrate supported on the support unit and rotates around a central axis, and a power transmitting member which is provided to correspond to the roll brush, is combined to both ends of the roll brush, and transmits power to both ends of the roll brush.</p>
申请公布号 KR20150090490(A) 申请公布日期 2015.08.06
申请号 KR20140011191 申请日期 2014.01.29
申请人 SEMES CO., LTD. 发明人 JUNG, SEUNG HOON
分类号 H01L21/304;H01L21/302 主分类号 H01L21/304
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