| 发明名称 |
WAFER ALIGNMENT MARK SCHEME |
| 摘要 |
A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a first wafer and a second wafer. The light source is configured to provide a first light directed to the first wafer and a second light directed to the second wafer. The light detection device is configured to detect reflected light intensity from the first wafer to find a position of at least one wafer alignment mark of the first wafer and to detect reflected light intensity from the second wafer to find a position of at least one wafer alignment mark of the second wafer. |
| 申请公布号 |
US2015219448(A1) |
申请公布日期 |
2015.08.06 |
| 申请号 |
US201514688766 |
申请日期 |
2015.04.16 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
TSENG Wei-Hsiang;WANG Chao-Hsiung;LIN Chin-Hsiang;LIU Heng-Hsin;CHEN Ho-Ping;PENG Jui-Chun |
| 分类号 |
G01B11/27;H01L23/544;H01L21/66 |
主分类号 |
G01B11/27 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A wafer alignment apparatus, comprising:
a light source; a light detection device; and a rotation device configured to rotate a first wafer and a second wafer, wherein the light source is configured to provide a first light directed to the first wafer and a second light directed to the second wafer, the light detection device is configured to detect reflected light intensity from the first wafer to find a position of at least one wafer alignment mark of the first wafer and to detect reflected light intensity from the second wafer to find a position of at least one wafer alignment mark of the second wafer. |
| 地址 |
Hsinchu TW |
