METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME

摘要

A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter, A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.

主权项

1. A semiconductor device manufacturing apparatus comprising:
a weak feature identification unit configured to identify weak features from among a plurality of features included in a photolithography pattern to be formed on a mask or a substrate, wherein a possibility of failure of the weak features is greater than a reference value; a region classification unit configured to classify the weak features to include first and second regions; a shot method determination unit configured to determine respective first and second dosages for the first and second regions; and an exposure unit configured to expose on the first and second regions with the first and second dosages.