SPATIAL DEPOSITION OF MATERIAL USING SHORT-DISTANCE RECIPROCATING MOTIONS

摘要

Embodiments relate to performing deposition of material on a substrate by causing short-distance reciprocating motions of the substrate. A series of reactors for injecting material onto the substrate is arranged along the length of the substrate in a repeating manner. During each reciprocating motion, the susceptor moves a distance shorter than an entire length of the substrate. Portions of the substrate are injected with materials by a subset of reactors. Since the movement of the substrate is smaller, a linear deposition device including the susceptor may be made smaller.

主权项

1. A method of depositing a layer on a substrate, comprising:
(a) causing a relative movement between a substrate and reactors in a first direction by a first distance shorter than a length of the substrate during injection of gas by the reactors; (b) causing a relative movement between the substrate and the reactors in a second direction opposite to the first direction by a second distance shorter than the first distance during injection of the gas by the reactors; (c) repeating (a) and (b) for a first predetermined number of times; (d) causing a relative movement between the substrate and the reactors in the first direction by a third distance shorter than the length of the substrate during injection of the gas by the reactors; (e) causing a relative movement between the substrate and the reactors in the second direction by a fourth distance longer than the third distance during injection of the gas by the reactors.