| 摘要 |
An installation for chemical vapor infiltration of porous preforms of three-dimensional shape extending mainly in a longitudinal direction, the installation comprising a reaction chamber of parallelepiped shape, the side walls of the reaction chamber including heater means and a plurality of stacks of loader devices arranged in the reaction chamber. Each loader device being in the form of an enclosure of parallelepiped shape provided with support elements for receiving porous preforms for infiltrating. |
