| 发明名称 |
PROCESS CONVERSION DIFFERENCE PREDICTION DEVICE, PROCESS CONVERSION DIFFERENCE PREDICTION METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM CONTAINING A PROCESS CONVERSION DIFFERENCE PREDICTION PROGRAM |
| 摘要 |
According to one embodiment, a process conversion difference in a processed pattern having undergone a process via the resist pattern can be predicted, based on results of simulation of a cross-sectional shape of the resist pattern by which predicted values of resist dimensions adapted to a relationship between a parameter for lithography and actual measurement values of the resist dimensions. |
| 申请公布号 |
US2015220846(A1) |
申请公布日期 |
2015.08.06 |
| 申请号 |
US201414288523 |
申请日期 |
2014.05.28 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
INOUE Ai;Inomoto Minoru;Masukawa Kazuyuki;Sho Koutarou;Miyoshi Seiro;Usui Satoshi |
| 分类号 |
G06N5/04;G06F17/50 |
主分类号 |
G06N5/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A process conversion difference prediction device, wherein the device configured to predict a process conversion difference in a processed pattern having undergone a process via a resist pattern, based on results of simulation of a cross-sectional shape of the resist pattern by which predicted values of resist dimensions adapted to a relationship between a parameter for lithography and actual measurement values of the resist dimensions are obtained. |
| 地址 |
Minato-ku JP |
