发明名称 |
FILM THICKNESS MEASUREMENT DEVICE |
摘要 |
A measurement head (23) irradiates a film (12) of a product substrate (10) with primary X-rays to detect fluorescent X-rays generated from the film (12). Analysis means (33) obtains thickness of the film (12) from intensity of the fluorescent X-rays detected by the measurement head (23). |
申请公布号 |
US2015219450(A1) |
申请公布日期 |
2015.08.06 |
申请号 |
US201314420714 |
申请日期 |
2013.08.23 |
申请人 |
Sharp Kabushiki Kaisha |
发明人 |
Hohshi Norikazu;Sakagami Hidekazu;Harada Narumi;Yamawaki Chiaki |
分类号 |
G01B15/02;G01N23/223;G01N23/205 |
主分类号 |
G01B15/02 |
代理机构 |
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代理人 |
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主权项 |
1. A film thickness measurement device, comprising:
a base (1); a substrate stage (2) which is provided on the base (1) and on which a product substrate (10) having a film is placed; a gantry (4) that extends in a first direction (A) with respect to the substrate stage (2) and is installed in the base (1) so as to be movable in a second direction (B) with respect to the substrate stage (2); a slider (5) that is installed in the gantry (4) so as to be movable in the first direction (A); a measurement head (23) that is fixed to the slider (5) and irradiates a film (12) of the product substrate (10) placed on the substrate stage (2) with primary X-rays to detect fluorescent X-rays generated from the film (12); and analysis means (33) that obtains thickness of the film (12) from intensity of the fluorescent X-rays detected by the measurement head (23). |
地址 |
Osaka-shi, Osaka JP |