发明名称 FILM THICKNESS MEASUREMENT DEVICE
摘要 A measurement head (23) irradiates a film (12) of a product substrate (10) with primary X-rays to detect fluorescent X-rays generated from the film (12). Analysis means (33) obtains thickness of the film (12) from intensity of the fluorescent X-rays detected by the measurement head (23).
申请公布号 US2015219450(A1) 申请公布日期 2015.08.06
申请号 US201314420714 申请日期 2013.08.23
申请人 Sharp Kabushiki Kaisha 发明人 Hohshi Norikazu;Sakagami Hidekazu;Harada Narumi;Yamawaki Chiaki
分类号 G01B15/02;G01N23/223;G01N23/205 主分类号 G01B15/02
代理机构 代理人
主权项 1. A film thickness measurement device, comprising: a base (1); a substrate stage (2) which is provided on the base (1) and on which a product substrate (10) having a film is placed; a gantry (4) that extends in a first direction (A) with respect to the substrate stage (2) and is installed in the base (1) so as to be movable in a second direction (B) with respect to the substrate stage (2); a slider (5) that is installed in the gantry (4) so as to be movable in the first direction (A); a measurement head (23) that is fixed to the slider (5) and irradiates a film (12) of the product substrate (10) placed on the substrate stage (2) with primary X-rays to detect fluorescent X-rays generated from the film (12); and analysis means (33) that obtains thickness of the film (12) from intensity of the fluorescent X-rays detected by the measurement head (23).
地址 Osaka-shi, Osaka JP