发明名称 PROCESSES FOR FORMING COMPOSITE STRUCTURES WITH A TWO-DIMENSIONAL MATERIAL USING A POROUS, NON-SACRIFICIAL SUPPORTING LAYER
摘要 It can be difficult to remove atomically thin films, such as graphene, graphene-based material and other two-dimensional materials, from a growth substrate and then to transfer the thin films to a secondary substrate. Tearing and conformality issues can arise during the removal and transfer processes. Processes for forming a composite structure by manipulating a two-dimensional material, such as graphene or graphene-base material, can include: providing a two-dimensional material adhered to a growth substrate; depositing a supporting layer on the two-dimensional material while the two-dimensional material is adhered to the growth substrate; and releasing the two-dimensional material from the growth substrate, the two-dimensional material remaining in contact with the supporting layer following release of the two-dimensional material from the growth substrate.
申请公布号 CA2938305(A1) 申请公布日期 2015.08.06
申请号 CA20152938305 申请日期 2015.01.29
申请人 LOCKHEED MARTIN CORPORATION 发明人 SINSABAUGH, STEVEN LLOYD;BEDWORTH, PETER V.;CASEY, DAVID FRANCIS, JR.;HEISE, SCOTT E.;SINTON, STEVEN W.;STOLTENBERG, RANDALL MARK;SWETT, JACOB LOUIS
分类号 B01D39/20;B01D39/16 主分类号 B01D39/20
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