METHOD OF MANUFACTURING DISPLAY DEVICE

摘要

A method of manufacturing a display device includes: forming a gate electrode on a substrate; forming a gate insulating film on the substrate; forming an oxide semiconductor on the substrate; forming a source electrode and a drain electrode on the substrate; forming a passivation film on the substrate; forming a common electrode on the substrate; forming an interlayer insulating film on the substrate; forming a pixel electrode on the substrate; forming an alignment film on the substrate; radiating UV-rays onto the oxide semiconductor; and heat-treating the oxide semiconductor irradiated with the UV-rays. The radiating UV-rays is performed after the forming an oxide semiconductor, and the heat-treating is performed after the forming a passivation film.

主权项

1. A method of manufacturing a display device, comprising:
forming a gate electrode on a substrate; forming a gate insulating film on the substrate having the gate electrode formed thereon; forming an oxide semiconductor on the substrate having the gate insulating film formed thereon; forming a source electrode and a drain electrode on the substrate having the oxide semiconductor formed thereon; forming a passivation film on the substrate having the source electrode and the drain electrode formed thereon; forming a common electrode on the substrate having the passivation film formed thereon; forming an interlayer insulating film on the substrate having the common electrode formed thereon; forming a pixel electrode on the substrate having the interlayer insulating film formed thereon; forming an alignment film on the substrate having the pixel electrode formed thereon; radiating UV-rays onto the oxide semiconductor; and heat-treating the oxide semiconductor irradiated with the UV-rays, wherein the radiating UV-rays is performed after the forming an oxide semiconductor, and wherein the heat-treating is performed after the forming a passivation film.