发明名称 ALUMINUM-GALLIUM-INDIUM-PHOSPHORUS-BASED LIGHT EMITTING DIODE HAVING GALLIUM NITRIDE LAYER OF UNEVEN TYPE AND METHOD FOR MANUFACUTURING SAME
摘要 The present invention relates to a light emitting diode and a method for manufacturing same, and more specifically relates to growing a GaN layer of high quality on an upper part of an AlGaInP-based light emitting diode to improve the light extraction efficiency of the light emitting diode, wherein the GaN layer has a larger band gap and a smaller refractive index than AlGaInP-based material. The AlGaInP-based light emitting diode of the present invention is characterized by forming the GaN layer on the upper surface, and the GaN layer preferably has a surface of a fine uneven pattern. The GaN layer can be grown in the same system after forming the AlGaInP-based light emitting diode without an additional process.
申请公布号 WO2015115685(A1) 申请公布日期 2015.08.06
申请号 WO2014KR00848 申请日期 2014.01.29
申请人 AUK CORP. 发明人 LEE, HYUNG JOO;KIM, YOUNG JIN;JANG, IN KYU
分类号 H01L33/26;H01L33/10;H01L33/22 主分类号 H01L33/26
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